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    DSAZSAA00014814.pdf

    • American Vacuum Society
    • Characterization of atomic layer deposition HfO2, Al2O3, and plasmaenhanced chemical vapor deposition Si3N4 as metal–insulator–metal capacitor dielectric for GaAs HBT technology Jiro Yota,a) Hon
    • Original

    DSAZSAA00014814.pdf preview Download Datasheet

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