DSAZSAA00014773.pdf

Partial File Text ALD HfO2 and Al2O3 as MIM Capacitor Dielectric for GaAs HBT Technology Jiro Yota GaAs Technology, Skyworks Solutions, Inc. 2427 W. Hillcrest Drive, Newbury Park, CA 91320, USA jiro.yota@skyworksin
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ALD HfO2 and Al2O3 as MIM Capacitor Dielectric for GaAs HBT Technology

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