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Scans-0084929.pdf
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Impact of Process Scaling on 1/f Noise in Advanced CMOS Technologies M.J. Knitel, P.H. Woerlee, A.J. Scholten, and A.T.A. Zegers-Van Duijnhoven Philips Research Laboratories, Prof. Holstlaan 4, 5
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ECAD Model
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